The workshop brings together experts from various fields of lithography simulation.
It will provide an excellent opportunity to exchange ideas and discuss results and developments in the areas of:

* Latest research activities and future developments in lithography and lithography simulation
* Limitations of present simulation models and necessary model extensions
* Sharing experiences and ideas from various field of expertise (modeling, tool & material suppliers, and semiconductor manufacturing)

The 2010 workshop will focus on these topics:

* New challenges arising in the simulation of double patterning
* Lithography with EUV - how critical are defects and how can they be detected?
* Lithography simulation and its connection to metrology
* Alternative lithogarphy techniques - direct optical and E-beam writing


Organizational information:
E-Mail: lithography@iisb.fraunhofer.de

Telephone: +49 9131 761 211

Address of the Institute:
Fraunhofer Institute of Integrated Systems and Device Technology
Schottkystr. 10
91058 Erlangen, Germany